SiNx Coating Deposition on CoCr by Plasma-Enhanced Chemical Vapor Deposition

Abstract Cobalt chromium alloys (CoCr) are commonly used as total disc replacement components. However, there concerns about its long-term biological effects. Coating the CoCr with a ceramic could improve implant’s biocompatibility and wear resistance. Silicon nitride (SiNx) coatings have emerged recent alternative to this end. While many evaluated physical vapour deposition (PVD) techniques deposit these coatings, plasma-enhanced chemical (PECVD) may provide certain advantages. For example, it allow for low-temperature depositions well more uniform of complex structures. In study, silicon different nitrogen-to-silicon (N/Si ratio) compositions (0.65, 1.16 1.42) were deposited onto substrates by PECVD. It was found that SiNx coating at an NH 3 flow rate 30 sccm (i.e., N/Si ratio 1.42), had highest hardness elastic modulus, 13.19 ± 1.29 GPa 132.76 9.32 GPa, respectively. roughness adequate application be measured, further optimization adhesion is needed adequately evaluate properties. concluded PECVD showed potential intended application.